High Efficiency X-ray Source: Tailoring a Plasma Focus Device for Radiography - Safdar Hussain - Kirjat - VDM Verlag - 9783639151503 - tiistai 19. toukokuuta 2009
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High Efficiency X-ray Source: Tailoring a Plasma Focus Device for Radiography

Safdar Hussain

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NZD 123,75

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High Efficiency X-ray Source: Tailoring a Plasma Focus Device for Radiography

Systems capable of generating X-rays with specific features such as short pulse duration, small source size, high radiation intensity and a wide range in photon energy, are widely used for non-destructive testing, radiography of dynamic biological objects, dynamical studies of biomedical systems, testing the performance of electronic devices in the high-energy density field of X-rays, sterilization of food and transmutation of organic material. This book provides systematic and comprehensive investigation of the X-ray emission from the plasma focus device and correlates the emission parameters with the operating conditions to obtain high energy/ intensity photons. The information on the X-ray emission characteristics presented in this book indicates that the plasma focus meets the requirements for the abovementioned applications. The findings are extremely important not only for academic studies, but can also serve as a foundation for future applications of X-rays emitted by dense plasma focus devices.

Media Kirjat     Paperback Book   (Kirja pehmeillä kansilla ja liimatulla selällä)
Julkaisupäivämäärä tiistai 19. toukokuuta 2009
ISBN13 9783639151503
Tuottaja VDM Verlag
Sivujen määrä 148
Mitta 226 g
Kieli English