High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications

I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.